Ultra high precision lithography temperature control
Application: Leica in Cambridge market electron
beam systems for wafer fabrication and approached Grant to replace
a temperature control system used in the focusing coils of a state
of the art hi resolution system.
Brief: To produce a multi refrigeration
system with very stable temperature control from an external room
to the electron beam system with pulse free flow. The units
had to communicate to the host computer via a device net
enabled data logger .
Grant's skill and technology: Our knowledge of
refrigeration enabled us to optimise the system for the required
temperatures, we sourced a specialist pump to eliminate pulse free
flow and our expertise in data acquisition and communications
enabled us to develop a device net enabled control box.
The outcome: Following the development and
installation of the first system, further systems have been ordered
and installed in the European and US markets.