Ultra high precision lithography temperature control

Ultra high precision lithography temperature control

Application: Leica in Cambridge market electron beam systems for wafer fabrication and approached Grant to replace a temperature control system used in the focusing coils of a state of the art hi resolution system.

Brief: To produce  a multi refrigeration system with very stable temperature control from an external room to the electron beam system with pulse free flow. The units  had  to communicate to the host computer via a device net enabled data logger .

Grant's skill and technology: Our knowledge of refrigeration enabled us to optimise the system for the required temperatures, we sourced a specialist pump to eliminate pulse free flow and our expertise in data acquisition and communications enabled us to develop a device net enabled control box.

The outcome: Following the development and installation of the first system, further systems have been ordered and installed in the European and US markets.

Back